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 Morgan Advanced Ceramics Inc, CVD Materials provides the solution to your materials problem. We specialize in manufacturing by chemical vapor deposition (CVD), a process so demanding that only a handful of companies worldwide have mastered the art. The CVD process creates ultra-pure materials. Our Performance PBN materials of pyrolitic boron nitride and Performance SiC materials of silicon carbide, including low resistivity SiC, are used in high temperature furnace and electrical components; microwave and semiconductor components; gallium arsenide crystal production and more.
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Morgan Technical Ceramics, a Global Business unit of The Morgan Crucible Company Plc, manufactures products from a comprehensive range of ceramic, piezoelectric and dielectric materials, glass and precious metals.
 With manufacturing sites located in the USA, UK, Netherlands, Germany and China, we have established an enviable reputation for providing value-added solutions through world-class research and development, innovative design and, perhaps most important of all, applications engineering.
This website will introduce you to the company, the markets we address and the products and services we offer. We welcome the opportunity to discuss any specific requirements you have and our contact details are included for this purpose.
We trust that you will enjoy using this Website and look forward to utilising our materials and applications engineering expertise to provide you with elegant solutions to your problems.
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Plasma etch, RTP, and CVD deposition processes rely on the stiffness, high thermal conductivity, and chemical resistance of CVD SiC components.
Conductive silicon carbide components open up new ways to get energy into the chamber.
Crucibles of PBN, a unique material with anisotropic properties, provide outstanding performance in gallium arsenide (GaAs) crystal production and molecular beam epitaxy (MBE).
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Our advanced ceramics – Performance PBN and Performance SiC – have an impressive list of attributes:
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Chemically inert
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Theoretically dense
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Highly machinable
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Low outgasing at elevated temperatures
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High resistance to oxidation at elevated temperatures
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Retention of thermal and mechanical properties at temperatures beyond 2000° C
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Product deposition to "near net" shapes
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Availability in many shapes and sizes, including large flat plates
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The intrinsic purity typical of the chemical vapor deposition process
Morgan Advanced Ceramics Inc, CVD Materials works with your chemical, physical, electrical, and mechanical requirements to create innovative advanced ceramic solutions quickly, and with the quality you expect, to satisfy your most demanding applications. There are many benefits to using our materials in your manufacturing processes:
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Improve your production processes and product quality
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Drop particle counts as much as 50% in applications where PerformanceSiC silicon carbide replaces other materials
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Shorten new product times to market.
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Reduce the costs of ownership of your equipment.
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Increase life of consumables
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Our materials provide superior performance in many applications in both semiconductor and compound semiconductor processing.
Semiconductor
Compound Semiconductor and Microwave
Dry Etch RTP CVD
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susceptors
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processing chambers
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liners
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gas distribution plates
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wafer carriers
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edge rings
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electrostatic chucks
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sputter targets
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heating elements
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electrodes
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RF components
GaAs crystal growth MBE
We can help you eliminate particulates in your chamber and solve other pressing materials problems. Contact us.
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